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Ultrapure water for microelectronics

Meet ASTM & SEMI standards for the semiconductor industry

Manufacturing processes in the semiconductor industry require ultrapure water at nearly every phase. Treating intake water to high-quality levels requires processes and water treatment technologies to remove contaminants, minerals, microorganisms, and trace organic and nonorganic chemicals. Simply meeting today's water quality demands is not good enough and Xylem understands that the next technology cycle will call for even more rigorous specifications that add to the cost of every chip produced. Our extensive portfolio of technologies can address the three steps of an ultrapure water system; Makeup, Primary, and Polishing systems.

3 steps of an ultrapure water system

  • Makeup systems - include filtration, granular activated carbon/chlorine control, softening/scale control, pH adjust and reverse osmosis. 

  • Primary systems - include TOC reduction UV, membrane-based degasification, deionization (CEDI or mixed beds) and sub-micron filtration. Xylem’s VNX-EX CEDI systems are designed specifically for the semiconductor industry with a second-to-none silica and boron removal capability.

  •  Polishing systems - include TOC reduction UV, membrane-based degasification, mixed bed deionization, sub-micron filtration and ultrafiltration. Xylem’s NR-45 Meg Nano mixed bed ion exchange resin is our latest generation product which has been tested to SEMI C-93 protocols. 

Keeping ultrapure water systems operating at peak performance is critical to maintaining product quality and production uptime. Xylem’s Sophis™ Digital Services combines 24/7 remote monitoring with predictive analytics, engineering expertise, and proactive service to help identify potential issues early, optimize system performance, and reduce operational risk.

We can also help address mixed bed resin exchange, preventative maintenance, and operational contracts. Our retrofit and upgrade solutions improve water quality, reliability, reduce operating costs and increase capacity. For Point of Use (POU) applications, our Vanox® POU System and Vanox POU-F Filtration products produce water exceeding ASTM E-1.2 standards.